Highly productive, modular laser sintering system for the Additive Manufacturing of high-performance plastic components.
EOSINT P 800 is the world’s first laser sintering system for the Additive Manufacturing of high-performance plastic products at the necessary high process temperatures (High-Temperature Laser Sintering, HTLS). The system uses a layering process on high-melt polymers at temperatures of up to 385 °C, producing parts with remarkable properties. During the production process, the integrated Online Laser Power Control module (OLPC) module continuously monitors laser performance and thus ensures optimum, reproducible results on the components.
- The world’s first laser sintering system for the Additive Manufacturing of high-performance plastic products
- The system is designed for high-performance polymers using High-Temperature Laser Sintering (HTLS) technology. The adapted process with process temperatures of up to 385 °C exploits the Additive Manufacturing possibilities of thermoplastics to the full
- The best possible use of the property profile of high-performance polymers
- The continuous monitoring of laser performance by the Online Laser Power Control module (OLPC) drastically reduces possible variations in quality
- In addition the partly deficient heat dissipation is responsible for long cooling periods for the manufactured products. After all, component produced from these materials can perform just as well as metal materials but weigh far less
- The energy-intensive process was made much more cost-effective through the use of efficient machine insulation
- The shortest possible throughput times thanks to optimised processes
- The heavily insulated machine enables the high-temperature EOS PEEK HP3 material to be processed in an energy-efficient way
- Easy integration in existing production environments
- Modular, upgradeable EOSINT system
- Convenient handling thanks to a high level of automation
- Low-dust, ergonomically efficient working conditions
- Blade cartridge concept makes for easy adjustment and uncomplicated changes of layer thickness